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Nucleation and growth of highly-crystalline silicon nanoparticles

1st May 2014 by Gillian Conlane

highly-crystalline-silicon-nanoparticles

Scientists of the Network have investigated and tested nucleation and growth of highly-crystalline silicon nanoparticles in atmospheric-pressure low-temperature microplasmas at gas temperatures well below the Si crystallization threshold and within a short (100 μs) period of time. The model reveals that collision-enhanced ion fluxes can effectively increase the heat flux on the nanoparticle surface and this heating is controlled by the ion density. It is shown that nanoparticles can be heated to temperatures above the crystallization threshold. These combined experimental and theoretical results confirm the effective heating and structure control of Si nanoparticles at atmospheric pressure and low gas temperatures.

Filed Under: News

Plasma Science and Technology > Materials Processing and Nanotechnology > Energy and Environment

News and Events

  • Solar-thermal conversion with nano-Oxides (Nano Energy 108 2023 108112)
  • CNT for solar-thermal energy (Nanomaterials 12, 2022, 2705)
  • Plasma direct exsolution (Adv Energy Mater 12, 2022, 2201131)
  • D01 – Plasma Electrochemistry and Catalysis 2
  • Doping … more and better (J Mater Sci 57, 2022, 13314)

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